GR5 Titanium Target material refers to the sputtering source that forms various functional films on the substrate by magnetron sputtering，multi-arc ion plating, or other types of coating equipment under appropriate process conditions. Sputtering targets are widely used in decoration, moulds, glass, electronic devices, semiconductors, magnetic recording, plane display, solar cells, and many other fields.

Purity is one of the main performance indexes of the target material because the purity of the target material has a great influence on the thin performance.

Different target materials have different requirements for different impurity content under different conditions.

Usually, the target material is polycrystalline with grain sizes ranging from micron to millimetre. For the same target, the sputtering rate of the target with the fine grain is faster than that of the target with coarse grain. The thin films deposited by target sputtering with smaller grain size differences (uniform distribution) have a more uniform thickness distribution.

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High Purity Titanium Sputtering Target